Very high resolution etching of magnetic nanostructures in organic gases

Microelectronic Engineering

Volumn 85, Issue 5-6, 2008, Pages 988-991

  Kong, X ^a   Krasa D ^b   Zhou, H P ^a   Williams, W ^b   McVitie, S ^a   Weaver, J M R ^a   Wilkinson, C D W ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

^b UNIVERSITY OF EDINBURGH   (United Kingdom)

Author keywords

CH4 H2 O2; CO NH3; Dry etching; Fe; NiFe

Indexed keywords

CARBON MONOXIDE; DRY ETCHING; ORGANOMETALLICS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

ETCH RATES; VOLATILE METALLO-ORGANIC COMPOUNDS;

NANOSTRUCTURES;

EID: 44149112124     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.12.006     Document Type: Article

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