Determination of best focus and optimum dose for variable shaped e-beam systems by applying the isofocal dose method

Microelectronic Engineering

Volumn 85, Issue 5-6, 2008, Pages 778-781

  Keil, Katja ^a   Choi, Kang Hoon ^b   Hohle, Christoph ^b   Kretz, Johannes ^b   Lutz, Tarek ^b   Bettin, Lutz ^c   Boettcher, Monika ^c   Hahmann, Peter ^c   Kliem, Karl Heinz ^c   Schnabel, Bernd ^c   Irmscher, Mathias ^d   Sailer, Holger ^d  

^a Fraunhofer Center Nanoelectronic Technologies   (Germany)

^b QIMONDA DRESDEN GMBH AND CO OHG   (Germany)

^c Vistec Electron Beam GmbH   (Germany)

^d Institut fur Mikroelektronik Stuttgart   (Germany)

Author keywords

Bossung plot; E Beam lithography; High resolution; Isofocal dose; Process window

Indexed keywords

ELECTRON OPTICS; NUMERICAL METHODS; OPTICAL RESOLVING POWER; PHOTORESISTS;

ELECTRON BEAM DIRECT WRITE (EBDW); ISOFOCAL DOSE METHOD;

ELECTRON BEAM LITHOGRAPHY;

EID: 44149094302     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.01.042     Document Type: Article

References (4)

1. Hahmann P., Bettin L., Boettcher M., Denker U., Elster T., Jahr S., Kirschstein U.-C., Kliem K.-H., and Schnabel B. Microelectron. Eng. 84 (2007) 774
2. Zavecz T. Proc. SPIE 6152 (2006) 109
3. Bossung J.W. Proc. SPIE 100 (1977) 80
4. Sauer C., and Mack C.A. Proc. SPIE 3748 (1999) 27