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Applied Surface Science

Volumn 254, Issue 17, 2008, Pages 5481-5486

Structure and electrical properties of CdIn2O4 thin films prepared by DC reactive magnetron sputtering

(8) Yang, F F a,b Fang, L a Zhang, S F a Sun, J S b Xu, Q T b Wu, S Y b Dong, J X a Kong, C Y c

a CHONGQING UNIVERSITY (China)

b Institute 53 (China)

c CHONGQING NORMAL UNIVERSITY (China)

Author keywords

CdIn2O4 thin films; DC reactive magnetron sputtering; Electrical properties; Structure

Indexed keywords

CADMIUM COMPOUNDS; MAGNETRON SPUTTERING; REACTIVE SPUTTERING; SURFACE MORPHOLOGY; X RAY DIFFRACTION;

ANNEALING TREATMENT; CHEMICAL COMPOSITION; DC REACTIVE MAGNETRON SPUTTERING; OXYGEN CONCENTRATION;

THIN FILMS;

EID: 43849109840 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2008.02.090 Document Type: Article

Times cited : (24)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.