Investigation of conditions for preparation of oriented nanotubes at department of microelectronics in a modified plasma-enhanced hot filament chemical vapor deposition reactor

Physica E: Low-Dimensional Systems and Nanostructures

Volumn 40, Issue 7, 2008, Pages 2247-2251

  Vinduska, Peter ^a   Janik, Jan ^a   Buc, Dalibor ^a  

^a SLOVAK UNIVERSITY OF TECHNOLOGY   (Slovakia)

Author keywords

Chemical vapor deposition; Nanotubes; Self assembly

Indexed keywords

CATALYST ACTIVITY; GROWTH RATE; MICROELECTRONICS; MOLECULAR ORIENTATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SELF ASSEMBLY;

CATALYST PARTICLES; ORIENTED NANOTUBES; PRE-DEPOSITED DIFFUSION BARRIERS;

NANOTUBES;

EID: 43849095140     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2007.10.099     Document Type: Article

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