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Volumn 57, Issue 1, 2008, Pages 509-512

Uncertainty evaluation for measurements of peak-to-valley surface form errors

Author keywords

Metrology; Spatially varying errors; Uncertainty

Indexed keywords

ACOUSTIC VARIABLES MEASUREMENT; MEASUREMENT THEORY; SPECIFICATIONS; UNCERTAINTY ANALYSIS;

EID: 43649095237     PISSN: 00078506     EISSN: 17260604     Source Type: Journal    
DOI: 10.1016/j.cirp.2008.03.084     Document Type: Article
Times cited : (35)

References (12)
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    • Silicon Wafer Thickness Variation Measurements Using the National Institute of Standards and Technology Infrared Interferometer
    • Schmitz T.L., Davies A., Evans C.J., and Parks R.E. Silicon Wafer Thickness Variation Measurements Using the National Institute of Standards and Technology Infrared Interferometer. Optical Engineering 42 (2003) 2281-2290
    • (2003) Optical Engineering , vol.42 , pp. 2281-2290
    • Schmitz, T.L.1    Davies, A.2    Evans, C.J.3    Parks, R.E.4
  • 3
    • 43649108078 scopus 로고    scopus 로고
    • ISO Guide to the Expression of Uncertainty in Measurement (1995).
    • ISO Guide to the Expression of Uncertainty in Measurement (1995).
  • 4
    • 43649108640 scopus 로고    scopus 로고
    • ISO 14253 (1998) Geometric product specification (gps)-Inspection by measurement of workpieces and measuring instruments-Part 1: Decision rules for proving conformance with specification.
    • ISO 14253 (1998) Geometric product specification (gps)-Inspection by measurement of workpieces and measuring instruments-Part 1: Decision rules for proving conformance with specification.
  • 5
    • 43649086629 scopus 로고    scopus 로고
    • ISO 10110 (2007) Optics and photonics-Preparation of drawings for optical elements and systems-Part 5: Surface form tolerances.
    • ISO 10110 (2007) Optics and photonics-Preparation of drawings for optical elements and systems-Part 5: Surface form tolerances.
  • 6
    • 43649098133 scopus 로고    scopus 로고
    • SEMI P37-1102 (2002) Specification for extreme ultraviolet lithography mask substrates.
    • SEMI P37-1102 (2002) Specification for extreme ultraviolet lithography mask substrates.
  • 9
    • 43649108079 scopus 로고    scopus 로고
    • Evans C (1996) PhD Thesis, University of Birmingham.
    • Evans C (1996) PhD Thesis, University of Birmingham.
  • 10
    • 0038488322 scopus 로고    scopus 로고
    • Estimating the Root Mean Square of a Wavefront and Its Uncertainty
    • Davies A.D., and Levinson M.S. Estimating the Root Mean Square of a Wavefront and Its Uncertainty. Applied Optics 40 (2001) 6203-6209
    • (2001) Applied Optics , vol.40 , pp. 6203-6209
    • Davies, A.D.1    Levinson, M.S.2
  • 11
    • 22344451692 scopus 로고    scopus 로고
    • Noise Bias Removal in Profile Measurements
    • Haitjema H., and Morel M.A.A. Noise Bias Removal in Profile Measurements. Measurement 38 (2005) 21-29
    • (2005) Measurement , vol.38 , pp. 21-29
    • Haitjema, H.1    Morel, M.A.A.2
  • 12
    • 43649090357 scopus 로고    scopus 로고
    • Evans C (2008) PVr-A Robust Amplitude Parameter for Surface and Wavefront Specification. ASC-OP1 Standards Committee, January 20th, Optical Engineering, in press.
    • Evans C (2008) PVr-A Robust Amplitude Parameter for Surface and Wavefront Specification. ASC-OP1 Standards Committee, January 20th, Optical Engineering, in press.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.