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Volumn 459, Issue 1-2, 2008, Pages 123-129

A new measurement and treatment for kinetics of isothermal oxidation of Si3N4

Author keywords

Ceramics; Isothermal kinetics; Nitride materials; Oxidation

Indexed keywords

MEASUREMENT THEORY; OXIDATION; REACTION KINETICS; THERMOGRAVIMETRIC ANALYSIS;

EID: 43549086865     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2007.04.255     Document Type: Article
Times cited : (44)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.