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Volumn 459, Issue 1-2, 2008, Pages 123-129
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A new measurement and treatment for kinetics of isothermal oxidation of Si3N4
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Author keywords
Ceramics; Isothermal kinetics; Nitride materials; Oxidation
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Indexed keywords
MEASUREMENT THEORY;
OXIDATION;
REACTION KINETICS;
THERMOGRAVIMETRIC ANALYSIS;
ISOTHERMAL KINETICS;
ISOTHERMAL OXIDATION;
NITRIDE MATERIALS;
SILICON COMPOUNDS;
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EID: 43549086865
PISSN: 09258388
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jallcom.2007.04.255 Document Type: Article |
Times cited : (44)
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References (18)
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