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Volumn 565, Issue 2-3, 2004, Pages 251-258

Effect of the chemical vapor deposition environment on the faceted surface of α-(0001) sapphire

Author keywords

Aluminum oxide; Atomic force microscopy, Auger electron spectroscopy; Chemical vapor deposition; Diamond; Etching; Growth; Surface structure, morphology, roughness, and topography

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; DIAMONDS; ELECTRON MICROSCOPY; EPITAXIAL GROWTH; ETCHING; HARDNESS; LOW ENERGY ELECTRON DIFFRACTION; MORPHOLOGY; SAPPHIRE; SILICON; SINGLE CRYSTALS; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 4344712196     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2004.07.016     Document Type: Article
Times cited : (3)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.