Sol-gel derived mesoporous silica films used as low dielectric constant materials

Thin Solid Films

Volumn 462-463, Issue SPEC. ISS., 2004, Pages 311-315

  Yu, Suzhu ^a   Wong, Terence K S ^a   Hu, Xiao ^b   Pita, Kantisara ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Low dielectric constant; Mesoporous materials; Nanostructures; Sol gel; Thin film

Indexed keywords

INTERMETAL DIELECTRICS (IMD); LOW DIELECTRIC CONSTANTS; MOLAR RATIO;

NANOSTRUCTURED MATERIALS; PERMITTIVITY; PORE SIZE; POROSITY; POROUS MATERIALS; SOL-GELS; THIN FILMS;

SILICA;

EID: 4344685317     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.05.029     Document Type: Article

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