Novel one-step aqueous solutions to replace pregate oxide cleans

IEEE Transactions on Semiconductor Manufacturing

Volumn 17, Issue 3, 2004, Pages 470-476

  Pan, Tung Ming ^a,b   Lei, Tan Fu ^a   Ko, Fu Hsiang ^c   Chao, Tien Sheng ^a,c   Chiu, Tzu Huan ^a   Lu, Chih Peng ^d  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b CHANG GUNG UNIVERSITY   (Taiwan)

^c NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^d Merck Kanto Advanced Chemicals Ltd   (Taiwan)

Author keywords

Cleaning; Ethylenediaminetetraacetic acid (EDTA); Pregate oxide; RCA method; Tetrapropylammonium hydroxide (TPAH)

Indexed keywords

ACETIC ACID; AMMONIUM COMPOUNDS; CLEANING; COMPLEXATION; ELECTROCHEMISTRY; INTEGRATED CIRCUIT MANUFACTURE; OXIDATION; SOLUTIONS; ULSI CIRCUITS;

ETHYLENEDIAMINETETRAACETIC ACID (EDTA); PREGATE OXIDE; RCA METHOD; TETRAPROPYLAMMONIUM HYDROXIDE;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 4344657252     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2004.831944     Document Type: Conference Paper

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