Time-based PEB adjustment for optimizing CD distributions

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 1, 2004, Pages 703-712

  Friedberg, Paul D ^a,b,c   Tang, Cherry ^a   Singh, Bhanwar ^a   Brueckner, Thomas ^a   Gründke, Wolfram ^a   Schulz, Bernd ^a   Spanos, Costas J ^b  

^a ADVANCED MICRO DEVICES   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Critical dimension variation; Lithography process control; Photolithography; Post exposure bake

Indexed keywords

CRITICAL DIMENSION VARIATION; LITHOGRAPHY PROCESS CONTROL; POST EXPOSURE BAKE; THERMAL MASS;

CORRELATION METHODS; ERROR ANALYSIS; HEATING; OPTIMIZATION; PROCESS CONTROL; SEMICONDUCTOR DEVICE MANUFACTURE; SENSORS; TEMPERATURE MEASUREMENT;

PHOTORESISTS;

EID: 4344617169     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535871     Document Type: Conference Paper

References (5)

1. M. Freed, M. V. P. Krüger, K. Poolla, C. Spanos, "Autonomous on-wafer sensors for process modeling, diagnosis, and control", IEEE Trans. on Semiconductor Manufacturing, Vol. 14, No. 3, pp. 255-264, Aug, 2001.
2. D. A. Steele, A. Coniglio, C. Tang, B. Singh, C. Spanos, S. Nip, "Characterizing post-exposure bake processing for transient and steady-state conditions, in the context of critical dimension control," in Metrology, Inspection, and Process Control for Microlithography XVI, D. Herr, ed., Proc. SPIE 4689, pp. 517-530, 2002.
3. Y. Lee, M. Sung, E. Lee, Y. Sohn, H. Bak, H. Oh, "Temperature Rising Effect of 193nm Chemically Amplified Resist during Post Exposure Bake," in Advances in Resist Technology and Processing XVII, F. Houlihan, ed., Proc. SPIE 3999, pp. 1000-1008, 2000.
4. M. D. Smith, C. A. Mack, J. S. Petersen, "Modeling the impact of thermal history during post exposure bake on the lithographic performance of chemically amplified resists," in Advances in Resist Technology and Processing XVIII, F. Houlihan, ed., Proc. SPIE 4345, pp. 1013-1021, 2001.
5. J. Bao, N. Jakatdar, X. Niu, C. Spanos, "Specular Spectroscopic Scatterometry", IEEE Trans. on Semiconductor Manufacturing, Vol. 14, No. 2, pp. 97-111, May 2001.