Effects of substrates on properties of tin oxide gas sensors

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 6 A, 2004, Pages 3493-3497

  Rue, Gi Hong ^a   Lee, Dae Sik ^b   Lee, Duk Dong ^a  

^a Kyungpook National University   (South Korea)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

Alcohol; Gas sensors; SnO2; Tin oxide; Variants structure; X ray scattering

Indexed keywords

ALCOHOLS; ATOMIC FORCE MICROSCOPY; CHEMICAL SENSORS; LIGHT SOURCES; MAGNETRON SPUTTERING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SENSITIVITY ANALYSIS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY SCATTERING;

SNO2; TIN OXIDE; VARIANTS STRUCTURE;

TIN COMPOUNDS;

EID: 4344578001     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.3493     Document Type: Article

References (16)

1. K. Ihokura: The stannic oxide gas sensor (CRC press, Tokyo, 1994).
2. S. Semancik, R. E. Cavicchi, G. E. Poirier and Y. Y. Sukhovev: The 5th Int. Meet. Chemical Sensors, Rome, Italy, 1994, p. 536.
3. D. Liu, Q. Wang, H. L. M. Chang and H. Chen: J. Mater. Res. 10 (1995) 1516.
4. T. Seiyama: Denki Kagaku: 40 (1972) 244.
5. W. Gopel and K. D. Schierbaum: Sens. Actuat. B 26-27 (1995) 1.
6. J. W. Lim, H. H. Kim, B. H. Kang and D. D. Lee: J. Kor. Phys. Soc. 33 (1998) S432.
7. R. E. Cavicchi, S. Semancik, M. D. Antonik and R. J. Lad: Appl. Phys. Lett. 61 (1992) 1921.
8. P. B. Weisz: J. Chem. Phys. 21 (1953) 1531.
9. M. J. Madou and S. R. Morrison: Chemical Sensing with Solid State Devices (Academic Press, New York, 1989) pp. 35, 159, 171.
10. P. G. Harrison and M. J. Willett: J. Chem Soc.: Faraday Trans I 8 (1989) 1907.
11. V. M. Kaganer, R. Kohler, M. Schmidbauer. R. Opitz and B. Jenchen: Phys. Rev. B 55 (1997) 1793.
12. D.-S. Lee, J.-S. Huh, Y.-H. Hong, D.-D. Lee: J. Kor. Phys. Soc. 35 (1999) S1092.
13. G. S. Bales, R. Bruinsma, E. A. Eklund, J. Rudnick and A. Zangwill: Science 249 (1990) 264.
14. C. M. Wolfe: Physical properties semiconductors (Prentice Hall, New Jersey, USA, 1989).
15. S. Hamzaoui and M. Adnane: Appl. Ene. 65 (2000) 19.
16. D.-S. Lee, C.-H. Shim, J.-H. Lee and D.-D. Lee: Proceedings of international Workshop on Nitride Semiconductors (The Institute of Pure and Applied Physics, Tokyo, 2000) p. 919.