〈110〉 orientation and location controlled Si grains through combined MILC and μ -Czochralski process

IDW '07 - Proceedings of the 14th International Display Workshops

Volumn 3, Issue , 2007, Pages 2011-2012

  Tao, Chen ^a   Ishihara, Ryoichi ^a   Metselaar, J W ^a   Beenakker, C I M ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; CRYSTALLIZATION; EXCIMER LASERS; GRAIN BOUNDARIES;

MILC POLY-SI PRECURSORS; SI GRAINS;

POLYSILICON;

EID: 43349091238     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (1)

1. Vikas Rana, Ryolchl Ishihara, Yasushi Hiroshima, Daisuke Abe, Satoshl Inoue, Tatsuya Shimoda, Wim Metselaar and Kees Beenakker: IEEE, Transaction on Electron Devices, VOL.52, NO. 12, DECEMBER 2005, pp2622-2628