Etching behavior of poly(vinylidene fluoride) thin films irradiated with ion beams - Effect of irradiated ions and pretreatment

Kobunshi Ronbunshu

Volumn 65, Issue 3, 2008, Pages 273-276

  Yamaki, Tetsuya ^a   Rohani, Rosiah ^a   Koshikawa, Hiroshi ^a   Takahashi, Shuichi ^a   Hasegawa, Shin ^a   Asano, Masaharu ^a   Voss, Kay Obbe ^b   Neumann, Reinhard ^b   Maekawa, Yasunari ^a  

^a JAPAN ATOMIC ENERGY AGENCY   (Japan)

^b GSI HELMHOLTZZENTRUM FÜR SCHWERIONENFORSCHUNG GMBH   (Germany)

Author keywords

Conductometry; Etching; High energy ion beam; Latent track; Poly(vinylidene fluoride)

Indexed keywords

ETCHING; ION BEAMS; SOLUTIONS; THERMOPLASTICS; THIN FILMS;

CONDUCTOMETRY; HIGH ENERGY ION BEAM; LATENT TRACK; POLYVINYLIDENE FLUORIDE;

FLUORINE CONTAINING POLYMERS;

ETCHING; IRRADIATION; POLYVINYLIDENE FLUORIDE; PRETREATMENT;

EID: 42949089837     PISSN: 03862186     EISSN: None     Source Type: Journal    
DOI: 10.1295/koron.65.273     Document Type: Article

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