Modification of interface magnetic anisotropy by ion irradiation on epitaxial Cu/Ni/Cu(002)/Si(100) films

Physical Review B - Condensed Matter and Materials Physics

Volumn 69, Issue 17, 2004, Pages

  Lee, J S ^a   Lee, K B ^a   Park, Y J ^a   Kim, T G ^b   Song, J H ^b   Chae, K H ^b   Lee, J ^c   Whang, C N ^c   Jeong, K ^c   Kim, D H ^d   Shin, S C ^d  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

^c Yonsei University   (South Korea)

^d Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; NICKEL; SILICON;

ANISOTROPY; ARTICLE; CRYSTAL STRUCTURE; FILM; ION IRRADIATION; IRRADIATION; MAGNETISM; RADIATION SCATTERING; SURFACE PROPERTY; THICKNESS; X RAY DIFFRACTION;

EID: 42749109024     PISSN: 01631829     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevB.69.172405     Document Type: Article

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