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It is important to stress that the symmetry identifications become less clear for higher order defect-induced scattering processes. However, the use of cutting lines and cutting line indices [see, Ge. G. Samsonidze, R. Saito, A. Jorio, M. A. Pimenta, A. G. Souza Filho, F. A. Grüneis, G. Dresselhaus, and M. S. Dresselhaus, J. Nanosci. Nanotechnol. 3, 431 (2003)] simplifies the symmetry identification in the different scattering processes.
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