Analysis of Cu segregation to oxide-metal interface of Ni-base alloy by HX-PES

Surface and Interface Analysis

Volumn 40, Issue 3-4, 2008, Pages 329-333

  Doi, Takashi ^a   Kitamura, Kazuyuki ^a   Nishiyama, Yoshitaka ^a   Otsuka, Nobuo ^a   Kudo, Takeo ^a   Sato, Masugu ^b   Ikenaga, Eiji ^b   Kobayashi, Keisuke ^b   Hashimoto, Tamotsu ^b  

^a Sumitomo Metal Industries Ltd   (Japan)

^b JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

Author keywords

HX PES; Metal dusting corrosion; Segregation

Indexed keywords

COPPER COMPOUNDS; OXIDES; SYNCHROTRON RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

CU SEGREGATION; OXIDE-METAL INTERFACE;

NICKEL ALLOYS;

EID: 42449117952     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2653     Document Type: Conference Paper

References (16)

1. Prange FA. Corrosion 1959; 15: 619t.
2. Grabke HJ, Krajak R, Müller-Lorenz LM. Werkst. Korros. 1993; 44: 89.
3. Pipple E, Woltersdorf J, Schneider R. Mater. Corros. 1998; 50: 309.
4. Nishiyama Y, Kudo T, Otsuka N. Mater. Trans. 2005; 46: 1890.
5. Nishiyama Y, Moriguchi K, Otsuka N, Kudo T. Mater. Corros. 2005; 56: 806.
6. Nishiyama Y, Otsuka N. Mater. Sci. Forum 2006; 522-523: 581.
7. Webber PR, Rojas CE, Dobson PJ. Surf. Sci. 1981; 105: 20.
8. Olefjord I, Wegrelius L. Corros. Sci. 1990; 31: 89.
9. Suzuki S, Kosaka T, Inoue H, lsshiki M, Waseda Y. Appl. Surf. Sci. 1996; 103: 495.
10. Kobayashi K, Yabashi M, Takata Y, Tokushima T, Shin S, Tamasaku K, Miwa D, Ishikawa T, Nohira H, Hattori T, Sugita Y, Nakatsuka O, Sakai A, Zaima S. Appl. Phys. Lett. 2003; 83: 1005.
11. Yeh JJ, Lidau I. At. Data Nucl. Data Tables 1985; 32: 1.
12. Shirley DA. Phys. Rev. B 1972; 5: 4709.
13. Ünveren E. Kemnitz E, Hutton S, Lippitz A, Unger WES. Surf. Interface Anal. 2004; 36: 92.
14. Chawla SK, Sankarraman N, Payer JH. J. Electron Spectrosc. Relat. Phenom. 1992; 61: 1.
15. Mizokawa Y, Miyasato T, Nakamura S, Geib KM, Wilmsen CW. J. Vac. Sci. Technol., A 1987; 5: 2809.
16. Kvon RI, Koscheev SV, Boronin AI. J. Mol. Catal. A: Chem. 2000; 158: 297.