-
1
-
-
42449083437
-
-
K.H. Becker, U. Kogelschatz, K.H. Schoenbach, R.J. Barker, Eds., Non-Equilibrium Air Plasmas at Atmospheric Pressure, IOP Publishing Ltd, Bristol, UK, (now: Taylor & Francis, CRC Press), pp. 621-642 (2004).
-
K.H. Becker, U. Kogelschatz, K.H. Schoenbach, R.J. Barker, Eds., Non-Equilibrium Air Plasmas at Atmospheric Pressure, IOP Publishing Ltd, Bristol, UK, (now: Taylor & Francis, CRC Press), pp. 621-642 (2004).
-
-
-
-
2
-
-
42449111375
-
-
Electrical Discharges for Environmental Purposes:, Nova Science Publisher, Inc, pp
-
E.M. Van Veldhuizen, Electrical Discharges for Environmental Purposes: Fundamentals and Applications, Nova Science Publisher, Inc., pp. 221-427 (2000).
-
(2000)
Fundamentals and Applications
, pp. 221-427
-
-
Van Veldhuizen, E.M.1
-
5
-
-
23444434766
-
-
H.H. Kim, Plasma Process. Polym., 1 (2), 91-110 (2004).
-
H.H. Kim, Plasma Process. Polym., 1 (2), 91-110 (2004).
-
-
-
-
7
-
-
18844416868
-
-
Y.C. Hong, H.S. Uhm, H.S. Kim, M.J. Han, S.C. Ko, S.K. Park, IEEE Transactions on Plasma Science, 33, 958-963 (2005).
-
(2005)
IEEE Transactions on Plasma Science
, vol.33
, pp. 958-963
-
-
Hong, Y.C.1
Uhm, H.S.2
Kim, H.S.3
Han, M.J.4
Ko, S.C.5
Park, S.K.6
-
9
-
-
85045796000
-
-
M. Jasihski, J. Mizeraczyk, Z. Zakrzewski, Journal of Advanced Oxidation Technologies, 1, 51-58 (2004).
-
(2004)
Journal of Advanced Oxidation Technologies
, vol.1
, pp. 51-58
-
-
Jasihski, M.1
Mizeraczyk, J.2
Zakrzewski, Z.3
-
10
-
-
0037151954
-
-
M. Jasihski, J. Mizeraczyk, Z. Zakrzewski, T. Ohkubo, J.S. Chang, Journal of Physics D: Applied Physics, 35, 2274-2280 (2002).
-
(2002)
Journal of Physics D: Applied Physics
, vol.35
, pp. 2274-2280
-
-
Jasihski, M.1
Mizeraczyk, J.2
Zakrzewski, Z.3
Ohkubo, T.4
Chang, J.S.5
-
12
-
-
0036469404
-
-
Y. Kabouzi, M.D. Calzada, M. Moisan, K.C. Tran, C. Trassy, Plasma Sources Sci. Technol., 91, 1008-1019 (2002).
-
(2002)
Plasma Sources Sci. Technol
, vol.91
, pp. 1008-1019
-
-
Kabouzi, Y.1
Calzada, M.D.2
Moisan, M.3
Tran, K.C.4
Trassy, C.5
-
13
-
-
42449150512
-
Process for purifying a gas and apparatus for the implementation of such a process
-
US Patent 6190510
-
J.C. Rostaing, J.C. Parent, F. Bryselbout, M.Moisan, Process for purifying a gas and apparatus for the implementation of such a process; US Patent 6190510.
-
-
-
Rostaing, J.C.1
Parent, J.C.2
Bryselbout, F.3
Moisan, M.4
-
14
-
-
42449109229
-
Novel Post-Pump PFC Abatement Technology Based on Atmospheric Surface-Wave Microwave Plasmas, Future Fab Intl. (2/11/2003)
-
J.C. Rostaing, Novel Post-Pump PFC Abatement Technology Based on Atmospheric Surface-Wave Microwave Plasmas, Future Fab Intl. (2/11/2003), Volume 14.
-
, vol.14
-
-
Rostaing, J.C.1
-
17
-
-
36149031440
-
-
M. Moisan, G. Sauve, Z. Zakrzewski, J. Hubert, Plasma Sources Sci. Technol., 3, .584-592 (1994).
-
(1994)
Plasma Sources Sci. Technol
, vol.3
, pp. 584-592
-
-
Moisan, M.1
Sauve, G.2
Zakrzewski, Z.3
Hubert, J.4
-
18
-
-
0035418012
-
-
M. Moisan, Z. Zakrzewski, J.C. Rostaining, Plasma Sources Sci. Technol., 10, 387-394 (2001).
-
(2001)
Plasma Sources Sci. Technol
, vol.10
, pp. 387-394
-
-
Moisan, M.1
Zakrzewski, Z.2
Rostaining, J.C.3
-
19
-
-
0035302958
-
-
K.M. Green, M.C. Borras, P.P. Woskow, G.J. Flores, K. Hadidi, P. Thomas, IEEE Transactions on Plasma Science, 29, 399-406 (2001).
-
(2001)
IEEE Transactions on Plasma Science
, vol.29
, pp. 399-406
-
-
Green, K.M.1
Borras, M.C.2
Woskow, P.P.3
Flores, G.J.4
Hadidi, K.5
Thomas, P.6
-
20
-
-
32144443702
-
-
R. Foest, M. Schmidt, K Becker, International Journal of Mass Spectrometry, 248, 87-102 (2006).
-
(2006)
International Journal of Mass Spectrometry
, vol.248
, pp. 87-102
-
-
Foest, R.1
Schmidt, M.2
Becker, K.3
-
22
-
-
42449157293
-
-
http://www.loim.vrn.ru/index.php?m=63&page=58&nm=74&p=2.3.56. 64.70. 71.72.73. 74.
-
http://www.loim.vrn.ru/index.php?m=63&page=58&nm=74&p=2.3.56. 64.70. 71.72.73. 74.
-
-
-
|