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Volumn 993, Issue , 2008, Pages 287-294

Microwave plasma sources for gas processing

Author keywords

Emission of gaseous pollutants; Methane reforming; Microwave discharges; Microwave plasma sources; Plasma gas processing

Indexed keywords


EID: 42449095862     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2909131     Document Type: Conference Paper
Times cited : (7)

References (24)
  • 1
    • 42449083437 scopus 로고    scopus 로고
    • K.H. Becker, U. Kogelschatz, K.H. Schoenbach, R.J. Barker, Eds., Non-Equilibrium Air Plasmas at Atmospheric Pressure, IOP Publishing Ltd, Bristol, UK, (now: Taylor & Francis, CRC Press), pp. 621-642 (2004).
    • K.H. Becker, U. Kogelschatz, K.H. Schoenbach, R.J. Barker, Eds., Non-Equilibrium Air Plasmas at Atmospheric Pressure, IOP Publishing Ltd, Bristol, UK, (now: Taylor & Francis, CRC Press), pp. 621-642 (2004).
  • 2
    • 42449111375 scopus 로고    scopus 로고
    • Electrical Discharges for Environmental Purposes:, Nova Science Publisher, Inc, pp
    • E.M. Van Veldhuizen, Electrical Discharges for Environmental Purposes: Fundamentals and Applications, Nova Science Publisher, Inc., pp. 221-427 (2000).
    • (2000) Fundamentals and Applications , pp. 221-427
    • Van Veldhuizen, E.M.1
  • 5
    • 23444434766 scopus 로고    scopus 로고
    • H.H. Kim, Plasma Process. Polym., 1 (2), 91-110 (2004).
    • H.H. Kim, Plasma Process. Polym., 1 (2), 91-110 (2004).
  • 13
    • 42449150512 scopus 로고    scopus 로고
    • Process for purifying a gas and apparatus for the implementation of such a process
    • US Patent 6190510
    • J.C. Rostaing, J.C. Parent, F. Bryselbout, M.Moisan, Process for purifying a gas and apparatus for the implementation of such a process; US Patent 6190510.
    • Rostaing, J.C.1    Parent, J.C.2    Bryselbout, F.3    Moisan, M.4
  • 14
    • 42449109229 scopus 로고    scopus 로고
    • Novel Post-Pump PFC Abatement Technology Based on Atmospheric Surface-Wave Microwave Plasmas, Future Fab Intl. (2/11/2003)
    • J.C. Rostaing, Novel Post-Pump PFC Abatement Technology Based on Atmospheric Surface-Wave Microwave Plasmas, Future Fab Intl. (2/11/2003), Volume 14.
    • , vol.14
    • Rostaing, J.C.1
  • 22
    • 42449157293 scopus 로고    scopus 로고
    • http://www.loim.vrn.ru/index.php?m=63&page=58&nm=74&p=2.3.56. 64.70. 71.72.73. 74.
    • http://www.loim.vrn.ru/index.php?m=63&page=58&nm=74&p=2.3.56. 64.70. 71.72.73. 74.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.