Remote plasma chemical vapor deposition silicon oxynitride thin films: Dielectric properties

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 3, 1998, Pages 1087-1092

  Hemandez Velez M ^a   Sanchez Garrido O ^b   Fernandez Gutierrez F ^c   Falcony, C ^d   Martinez Duart J M ^b  

^a ISP E J Varona   (Cuba)

^b UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

^c ISP E J Varona   (Cuba)

^d DEPARTAMENTO DE FÍSICA   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 4244158849     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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