Ti/Al and Cr/Al ohmic contacts to n-type GaN formed by furnace annealing

Materials Science Forum

Volumn 264-268, Issue PART 2, 1998, Pages 1407-1410

  Papanicolaou, N A ^a   Edwards, A ^b   Rao, M V ^b   Mittereder, J A ^a   Anderson, W T ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

^b George Mason University   (United States)

Author keywords

Cr Al; Furnace Annealing; Low Resistivity; Ohmic Contacts; Ti Al

Indexed keywords

ALUMINUM; ANNEALING; CHROMIUM; ELECTRIC CONDUCTIVITY OF SOLIDS; HIGH TEMPERATURE APPLICATIONS; HIGH TEMPERATURE EFFECTS; METALLIC SUPERLATTICES; NITRIDES; OHMIC CONTACTS; QUARTZ APPLICATIONS; TITANIUM;

QUARTZ FURNACE ANNEALING;

SEMICONDUCTING GALLIUM COMPOUNDS;

EID: 4243266525     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.264-268.1407     Document Type: Article

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