MxP+: A new dielectric etcher with enabling technology, high productivity, and low cost-of-consumables

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 2, 1996, Pages 716-723

  Shan, Hongching ^a   Lee, Evans ^a   Welch, Michael ^a   Pu, Bryan ^a   Carducci, James ^a   Ke, Kuang Han ^a   Gao, Hua ^a   Luscher, Paul ^a   Crean, Gerard ^a   Wang, Rynn ^a   Blume, Richard ^a   Cooper, James ^a   Wu, Robert ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 4243084225     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588703     Document Type: Article

References (9)

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