A micromachined X-ray collector for space astronomy

TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems

Volumn , Issue , 2007, Pages 1321-1324

  Ezoe, Y ^a   Koshiishi, M ^a   Mita, M ^a   Maeda, Y ^a   Mitsuda, K ^a   Osawa, T ^b   Suzuki, M ^b   Hoshino, A ^b   Ishisaki, Y ^b   Takano, T ^c   Maeda, R ^c  

^a JAPAN AEROSPACE EXPLORATION AGENCY   (Japan)

^b TOKYO METROPOLITAN UNIVERSITY   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Anisotropic Wet Etching; Deep Reactive Ion Etching; Silicon (111) Planes; X ray collector

Indexed keywords

ACTUATORS; ASTROPHYSICS; ETCHING; MICROSYSTEMS; MIRRORS; OPTICAL DESIGN; SENSORS; SILICON; SILICON WAFERS; TRANSDUCERS; ULTRASONICS;

ANISOTROPIC WET ETCHING; DEEP REACTIVE ION ETCHING; INTERNATIONAL CONFERENCES; MICROMACHINED; RMS ROUGHNESS; SI(111); SILICON (111) PLANES; SMOOTH SURFACES; SOLID-STATE SENSORS; SPACE ASTRONOMY; X-RAY BEAMS; X-RAY COLLECTOR; X-RAY MIRRORS;

REACTIVE ION ETCHING;

EID: 42249106121     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SENSOR.2007.4300383     Document Type: Conference Paper

References (3)

1. Y.Ezoe, M.Koshiishi, M.Mita, K.Mitsuda, A. Hoshino, Y.Ishisaki, Z.Yang, T.Takano, R.Maeda, "Micro pore X-ray optics using anisotropic wet etching of (110) silicon wafers", Applied Optics, vol. 45, pp. 8932-8938, 2006
2. Y.Ezoe, M. Koshiishi, K. Mitsuda, "MEMS open the way to ultra-lightweight and low-cost x-ray optics", SPIE Newsroom, 2006 [on-line]
3. K.Ohwada, Y.Negoro, Y.Konaka, T.Oguchi, "Uniform groove-depths in (110) Si anisotropic etching by ultrasonic waves and application to accelerometer fabrication", Sensors and Actuators, A50, pp. 93-98, 1998