Development of a captured image simulator for 199 nm mask inspection tools

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6607, Issue PART 2, 2007, Pages

  Shiratsuchi, Masataka ^a   Honguh, Yoshinori ^a   Hirano, Ryoichi ^b   Ogawa, Riki ^b  

^a TOSHIBA CORPORATION   (Japan)

^b Advanced Mask Inspection Technology Inc   (Japan)

Author keywords

Captured image profile simulation; Mask inspection; Phase shifting mask; Rigorous coupled wave analysis

Indexed keywords

COMPUTER SIMULATION; IMAGE ACQUISITION; IMAGE ANALYSIS; IMAGE QUALITY; IMAGE RESOLUTION; LASERS; PHASE SHIFT;

CAPTURED IMAGE PROFILE SIMULATION; MASK INSPECTION; PHASE SHIFTING MASKS; RIGOROUS COUPLED WAVE ANALYSIS;

MASKS;

EID: 36248977530     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.729002     Document Type: Conference Paper

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