Haze generation effect by pellicle and packing box on photomask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6730, Issue , 2007, Pages

  Kim, Jong Min ^a   Patil, Manish ^a   Jeong, Woo Gun ^a   Hur, Ik Boum ^a   Shin, Cheol ^a   Jung, Sung Mo ^a   Choi, Moon Hwan ^a   Choi, Sang Soo ^a  

^a PKL Co   (South Korea)

Author keywords

Box; Haze; Outgas; Pellicle; Storage package material; Storage atmosphere; Sulfate free cleaning

Indexed keywords

EID: 42149085002     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.747121     Document Type: Conference Paper

References (5)

1. Oleg Kishkovich, Anatoly Grayfer and Frank V. Belanger "Contrarian Approach to and Ultimate Solution for 193nm Reticle Haze" Metrology, Inspection, and Process Control for Microlithography XXI, Proc. of SPIE Vol. 6518, 65183R, (2007)
2. 4 out gas on mask storage environment" Proc. of SPIE Vol. 5992, 599248, (2005)
3. Eric V. Johnstone, Laurent Dieu, Christian Chovino et al., "193nm Haze Contamination: A Close Relationship between Mask and its Environment" 23rd Annual BACUS Symposium on Photomask Technology, Proc. of SPIE Vol. 5256
4. Brian J. Grenon, Charles R. Peters and Kaustave Bhattacharyya "Investigation of reticle defect formation at DUV lithography" 22nd Annual BACUS Symposium on Photomask Technology, Proceedings of SPIE. Vol. 4889 (2002)
5. Jong-Min Kim, Jae-Chul Lee, Dong-Shik Kang, Dong-Heok Lee, et al., "Threshold Residual Ion Concentration on Photomask surface to Prevent Haze Defects" Photomask Japan 2007, proc. of SPIE vol. 6607