Survey of so4 out gas on mask storage environment

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 2, 2005, Pages

  Lee, Jun Sik ^a   Jee, Sung Bae ^a   Hwang, Sung Min ^a   Park, Hyun Yul ^a   Han, Oscar ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

AIM; ArF; Carrier Box; Fab Environment; Haze; IC(ion chromatography); Mask; Pellicle; Pellicle frame; Reticle; SMIF pod; SO4

Indexed keywords

ARGON; CHROMATOGRAPHY; GAS MASKS; GASES;

AIM; ARF; CARRIER BOX; FAB ENVIRONMENT; HAZE; IC(ION CHROMATOGRAPHY); PELLICLE; PELLICLE FRAME; SMIF POD; SO4;

SULFUR COMPOUNDS;

EID: 33644597729     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.626243     Document Type: Conference Paper

References (3)

1. Hiroyuki Ishii, Atsushi Tobita, Yusuke Shoji, Hiroko Tanaka " Root cause analysis for crystal growth at ArF excimer laser lithography" proceeding of SPIE Vol.5446
2. Chia Hwa Shiao et al. "Evaluation, Reduction and Monitoring of Progressive Defects on 193nm Reticles for Low-k1 Process" proceedings of SPIE Vol.5446
3. rd BACUS