The development and characteristics of a high-speed EELS mapping system for a dedicated STEM

Journal of Electron Microscopy

Volumn 57, Issue 2, 2008, Pages 41-45

  Isakozawa, Shigeto ^a   Kaji, Kazutoshi ^a   Jarausch, Konrad ^b   Terada, Shohei ^c   Baba, Norio ^d  

^a HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

^b Hitachi High Technologies America   (United States)

^c HITACHI LTD   (Japan)

^d KOGAKUIN UNIVERSITY   (Japan)

Author keywords

EELS imaging; Electron energy loss spectroscopy (EELS); Elemental mapping; Ratio map image; Scanning transmission electron microscope (STEM); Spatial resolution; Three window method

Indexed keywords

CHROMIUM; SILICON DIOXIDE; TITANIUM;

ARTICLE; CHEMISTRY; ELECTRON ENERGY LOSS SPECTROSCOPY; INSTRUMENTATION; METHODOLOGY; SCANNING TRANSMISSION ELECTRON MICROSCOPY;

CHROMIUM; MICROSCOPY, ELECTRON, SCANNING TRANSMISSION; SILICON DIOXIDE; SPECTROSCOPY, ELECTRON ENERGY-LOSS; TITANIUM;

DISSOCIATION; ELECTRON EMISSION; ELECTRON ENERGY LEVELS; ELECTRON SCATTERING; ELECTRONS; ENERGY DISSIPATION; IMAGE RESOLUTION; MAPPING; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON ENERGY LOSS SPECTROSCOPY IMAGING; ELECTRON ENERGY-LOSS SPECTROSCOPIES; ELEMENTAL MAPPING; MAP IMAGE; RATIO MAP IMAGE; SCANNING TRANSMISSION ELECTRON MICROSCOPE; SCANNING TRANSMISSION ELECTRON MICROSCOPES; SPATIAL RESOLUTION; THREE-WINDOW METHOD; WINDOW METHODS;

ELECTRON ENERGY LOSS SPECTROSCOPY;

EID: 41949128296     PISSN: 00220744     EISSN: 14779986     Source Type: Journal    
DOI: 10.1093/jmicro/dfn001     Document Type: Article

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