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Materials Science and Engineering: A

Volumn 481-482, Issue 1-2 C, 2008, Pages 623-625

Structuring of sputtered superelastic NiTi thin films by photolithography and etching

(4) Zamponi, Christiane a Rumpf, Holger a Schmutz, Clemens a Quandt, Eckhard a

a CENTER OF ADVANCED EUROPEAN STUDIES AND RESEARCH CAESAR (Germany)

Author keywords

Microstructure; NiTi; Photolithography; Sputtering; Superelasticity; Thin films

Indexed keywords

MECHANICAL STABILITY; METALLOGRAPHIC MICROSTRUCTURE; MICROMACHINING; PHOTOLITHOGRAPHY; SPUTTER DEPOSITION; TENSILE TESTING; THIN FILMS;

SUPERELASTICITY;

SHAPE MEMORY EFFECT;

MECHANICAL STABILITY; METALLOGRAPHIC MICROSTRUCTURE; MICROMACHINING; PHOTOLITHOGRAPHY; SHAPE MEMORY EFFECT; SPUTTER DEPOSITION; TENSILE TESTING; THIN FILMS;

EID: 41849129309 PISSN: 09215093 EISSN: None Source Type: Journal
DOI: 10.1016/j.msea.2006.10.216 Document Type: Article

Times cited : (23)

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