Characterization of PECVD silicon nitride passivation with photoluminescence imaging

Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4

Volumn 2, Issue , 2006, Pages 1372-1375

  Chen, Florence W ^a   Cotter, Jeffrey E ^a   Trupke, Thorsten ^a   Bardos, Robert A ^a  

^a UNIVERSITY OF NEW SOUTH WALES   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING SYSTEMS; PASSIVATION; PHOTOLUMINESCENCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

PHOTOLUMINESCENCE IMAGING; SILICON NITRIDE PASSIVATION;

SILICON NITRIDE;

EID: 41749115921     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/WCPEC.2006.279687     Document Type: Conference Paper

References (9)

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9. M. D. Abbott, J. E. Cotter, T. Trupke, K. Fisher, and R. Bardos, presented at this conference.