Load balancing among photolithography machines in the semiconductor manufacturing system

Journal of Information Science and Engineering

Volumn 24, Issue 2, 2008, Pages 379-391

  Shr, Arthur M D ^a,b   Liu, Alan ^a   Chen, Peter P ^b  

^a NATIONAL CHUNG CHENG UNIVERSITY   (Taiwan)

^b Louisiana State University   (United States)

Author keywords

Dedicated photolithography machine constraint; Load balancing; Photolithography; Resource schedule and execution matrix; Semiconductor manufacturing

Indexed keywords

COMPUTER SIMULATION; CONSTRAINT THEORY; PHOTOLITHOGRAPHY; RESOURCE ALLOCATION; SEMICONDUCTOR DEVICE MODELS;

DEDICATED PHOTOLITHOGRAPHY MACHINE CONSTRAINT; PHOTOLITHOGRAPHY MACHINE; RESOURCE SCHEDULE AND EXECUTION MATRIX;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 41549128007     PISSN: 10162364     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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