The role of electrochemical reactions during electrophoretic particle deposition

Journal of Colloid and Interface Science

Volumn 278, Issue 1, 2004, Pages 146-154

  Kershner, Ryan J ^a   Bullard, Joseph W ^a   Cima, Michael J ^a  

^a USA   (United States)

Author keywords

Atomic force microscopy (AFM); Colloid probe; Electrophoretic deposition (EPD); Isoelectric focusing; Microelectrodes; Microelectromechanical systems (MEMS); pH

Indexed keywords

ADHESION; ANODES; COLLOIDS; DC MOTORS; DEPOSITION; ELECTROCHEMISTRY; ELECTRODES; ELECTROLYTES; HYDROGEN; LITHOGRAPHY; MICROELECTRODES; PLATING; SAPPHIRE; SILICA; SUBSTRATES;

ELECTROPHORETIC PARTICLES; PARTICLE MOTION;

SURFACE CHEMISTRY;

HYDROGEN; PLATINUM; SILICON DIOXIDE;

ARTICLE; ATOMIC FORCE MICROSCOPY; ELECTROCHEMICAL ANALYSIS; ELECTRODE; ELECTROLYSIS; ELECTROPHORESIS; MEASUREMENT; MICROELECTRODE; MOLECULAR INTERACTION; MOTION; PH; PRIORITY JOURNAL; RECORDING; VIDEORECORDING;

ALUMINUM OXIDE; ELECTROCHEMISTRY; ELECTRODES; ELECTROPHORESIS; ELECTROPLATING; ELECTROSTATICS; KINETICS; MICROSCOPY, ATOMIC FORCE; SILICON DIOXIDE;

EID: 4143127802     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2004.05.017     Document Type: Article

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