Lithography tricks and tribulations

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2884, Issue , 1996, Pages 311-322

  Garofalo, Joseph G ^a   Watson, Pat G ^a   Trimble, Lee E ^a   Cirelli, Raymond A ^a   Colina, Albert ^b   Grodnensky, Ilya M ^c   Herrero, B ^b   Dunbar, A ^b   Peiffer, Frederick R ^a   Takahashi, R ^c   Tarascon Auriol, Regine G ^d   Yarbrough, Willie J ^b   Zych, Ludwik J ^c  

^a LUCENT TECHNOLOGIES   (United States)

^b NOKIA RESEARCH CENTER   (United States)

^c NIKON PRECISION INC   (United States)

^d DUPONT COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTINIDES; APPLICATION SPECIFIC INTEGRATED CIRCUITS; PHOTOLITHOGRAPHY;

ACTINIC RADIATIONS; ASSIST FEATURES; EXPOSURE SYSTEMS; OPTICAL ENHANCEMENTS; OPTICAL LITHOGRAPHIES; OPTICAL PROXIMITY CORRECTIONS; PHASE-SHIFT; RESOLUTION ENHANCEMENTS;

ELECTRIC POWER SUPPLIES TO APPARATUS;

EID: 58049092729     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.262814     Document Type: Conference Paper

References (6)

1. J. Garofalo, C. Biddick, R. Kostelak, S. Vaidya, "A mask assisted off-axis illumination technique for random logic", J. Vac. Sci & Technol. B, Vol 11 No. 6, p.2651 (1993).
2. 1 ASIC lithography", SPIE Optical Laser Microlithography VIII, 2440, p.302 (1995)
3. O. Otto, J. Garofalo, et.al, "Automated optical proximity correction: a rules based approach", SPIE Optical Laser Microlithography VII, 2197, p.278 (1994)
4. R. Pforr, A. Wong, K. Ronse, L. Van den hove, A. Yen, S. Palmer, G. Fuller, O. Otto, "Feature biasing versus feature-assisted lithography - a comparison of proximity correction methods for 0.5λ/NA lithography", SPIE Optical Laser Microlithography VIII, 2440, p.150 (1995)
5. N. Cobb, A. Zakhor, "Fast, low-complexity mask design", SPIE Optical Laser Microlithography VIII, 2440, p.3l3 (l995)
6. J. Garofalo, J. DeMarco, J. Bailey, J. Xiao, S. Vaidya "Reduction of ASIC gate-level line-shortening by mask compensation", SPIE Optical Laser Microlithography VIII, 2440, p.171 (1995)