Ultralow voltage imaging

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 3770-3773

  Hordon, L S ^a   Monahan, K M ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 4143078890     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588665     Document Type: Article

References (13)

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2. J. E. Barth and P. Kruit, Optik 101, 101 (1996).
3. Commercial software, MEBS Ltd., London, England.
4. R. F. W. Pease, Ninth Symposium on Electron, Ion, and Laser Beam Technology (San Francisco Press, San Francisco, 1967), p. 176.
5. W. D. Meisburger, A. D. Brodie, and A. A. Desai, J. Vac. Sci. Technol. B 10, 2804 (1992).
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7. L. S. Hordon, Z. Huang, N. Maluf, R. Browning, and R. F. W. Pease, J. Vac. Sci. Technol. B 11, 2299 (1993).
8. L. Reimer, Image Formation in Low-Voltage Scanning Electron Microscopy (SPIE, Bellingham, WA, 1993), p. 68.
9. L. Reimer, V. Golla, R. Böngoler, M. Kässens, B. Schindler, and R. Senkel, Optik 92, 14 (1992).
10. H. Seiler, Z. Angew. Phys. 22, 249 (1967).
11. L. Reimer, Scanning Electron Microscopy (Springer, Berlin, 1985), p. 29.
12. L. Reimer, Ref. 11, p. 47.
13. M. S. Chung and T. E. Everhart, J. Appl. Phys. 45, 707 (1974).