Evaluation of the mebes® 4500 reticle writer to commercial requirements of 250 nm design rule ic devices

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2793, Issue , 1996, Pages 438-451

  Abboud, F ^a   Alexander, D ^a   Coleman, T ^a   Cook, A ^a   Gasiorek, L ^a   Naber, R ^a   Raymond, F ^a   Sauer, C ^a  

^a Etec Systems Inc   (United States)

Author keywords

Composite error performance; Constituenterror; Dynamic grid matching; Maskmaking; Mebes; Metrology; Pattern generator; Phase shift mask; Positional accuracy

Indexed keywords

BUDGET CONTROL; INTEGRATED CIRCUITS; MEASUREMENT; OPTICAL INSTRUMENTS; PHOTOMASKS; PILOT PLANTS; X RAYS;

CONSTITUENTERROR; DYNAMIC GRID; ERROR PERFORMANCE; MASKMAKING; MEBES; PATTERN GENERATOR; PHASE-SHIFT MASK; POSITIONAL ACCURACY;

MASKS;

EID: 4143064370     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.245233     Document Type: Conference Paper

References (4)

1. J. DeWitt, J. Millino, J. Watson, R. Dean, R. Raymond, D. McClure, L. Gasiorek, F. Abboud, R. Naber, MEBES 4000 Optimization and Characterization of MEBES 4500, 14th Annual BACUS Conference on Photomask Technology and Management, SPifi vol. 2322, pg. 79-91, 1994.
2. J. DeWitt, J. Watson, D. Alexander, A. Cook, L. Gasiorek, M. Mayse, R. Naber, W. Phillips, C. Sauer, Investigation of MEBES 4500 System Composite Performance, 15th Annual BACUS Conference on Photomask Technology and Management, SPIE vol. 2621, pg. 19-26, 1995.
3. F. Abboud, R. Naber, R. Dean, C. Sauer, MEBES Reticle Writers for 350 nm and 250 nm Design Rules, Photomask and X-Ray Mask Technology I, SPIE vol. 2254, pg. 469-485, 1994.
4. J. DeWitt, J. Watson, T. Coleman, L. Gasiorek, M. Lubin, B. Naber, W. Wang, K. Wires, Method to Produce a Reference Grid Artifact for Matching a MEBES 4500 System to an External Reference, 15th Annual BACUS Conftrence on Photomask Technology and Management, SPIE vol. 2621, pg. 208-213, 1995.