NiSi schottky barrier process-strained Si (SB-PSS) CMOS technology for high performance applications

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 2006, Pages 80-81

  Ko, C H ^a   Chen, H W ^a   Wang, T J ^a   Kuan, T M ^a   Hsu, J W ^a   Huang, C Y ^a   Ge, C H ^a   Lai, L S ^a   Lee, W C ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; DRAIN CURRENT; GATE DIELECTRICS; NICKEL COMPOUNDS; ULTRATHIN FILMS;

PMOS DRIVE CURRENT; SERIES RESISTANCE; STRAIN EFFECTS;

SCHOTTKY BARRIER DIODES;

EID: 41149122697     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)

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