Influence of rf-power on the plasma carbonitriding of titanium

Materials Science and Engineering: A

Volumn 480, Issue 1-2, 2008, Pages 271-277

  Raaif, M ^a,b   El Hossary, F M ^a   Negm, N Z ^a   Khalil, S M ^a   Schaaf, P ^b  

^a Sohag University   (Egypt)

^b UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

Carbonitriding rate; Microhardness; rf plasma power; Surface roughness; Titanium; X ray diffraction

Indexed keywords

CARBONITRIDING; METALLOGRAPHIC MICROSTRUCTURE; MICROCRACKS; MICROHARDNESS; PLASMA APPLICATIONS; SURFACE ROUGHNESS;

CARBONITRIDING RATE; PLASMA CARBONITRIDING;

TITANIUM;

CARBONITRIDING; METALLOGRAPHIC MICROSTRUCTURE; MICROCRACKS; MICROHARDNESS; PLASMA APPLICATIONS; SURFACE ROUGHNESS; TITANIUM;

EID: 41149103595     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msea.2007.07.006     Document Type: Article

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