Directed self-assembly of thin block copolymer films under controlled atmosphere

Materials Research Society Symposium Proceedings

Volumn 961, Issue , 2006, Pages 20-25

  Kim, Sangcheol ^a,b   Briber, R M ^a   Karim, Alamgir ^b   Jones, Ronald L ^b   Kim, Ho Cheol ^c  

^a UNIVERSITY OF MARYLAND   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^c IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; POLYSTYRENES; SELF ASSEMBLY; THIN FILMS;

CONTROLLED ATMOSPHERE; THIN BLOCK COPOLYMER FILMS;

POLYMER FILMS;

EID: 40949119908     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-0961-o17-03     Document Type: Conference Paper

References (10)

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8. Certain equipment, instruments or materials are identified in this paper in order to adequately specify the experimental details. Such identification does not imply recommendation by the National Institute of Standards and Technology nor does it imply the materials are necessarily the best available for the purpose. Official contribution of the National Institute of Standards and Technology; not subject to copyright in the United States
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10. The data throughout the manuscript and in the figures and table are presented along with the standard uncertainty (±) involved in the measurement based on one standard deviation.