Optical properties of TiO2 film after annealing in nitrogen

Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams

Volumn 20, Issue 1, 2008, Pages 143-146

  Ju, Yong Feng ^a   Zu, Xiao Tao ^a   Xiang, Xia ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

Annealing; Energy gap; Ion implantation; Nitrogen doped TiO2 film

Indexed keywords

ANNEALING; ENERGY GAP; FUSED SILICA; ION IMPLANTATION; LIGHT ABSORPTION; OPTICAL PROPERTIES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING FILMS; ULTRAVIOLET VISIBLE SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

NITROGEN DOPED TITANIUM DIOXIDE FILM; OPTICAL ABSORPTION; SILICA GLASS;

TITANIUM DIOXIDE;

EID: 40949106342     PISSN: 10014322     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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