Methyl radical chemical reactions on a tungsten surface

Plasma Devices and Operations

Volumn 16, Issue 1, 2008, Pages 25-35

  Gorodetsky, A E ^a   Zalavutdinov, R Kh ^a   Vnukov, S P ^a   Bukhovets, V L ^a   Zakharov, A P ^a   Mazul, I V ^b   Makhankov, A N ^b  

^a FRUMKIN INSTITUTE OF PHYSICAL CHEMISTRY AND ELECTROCHEMISTRY   (Russian Federation)

^b EFREMOV INSTITUTE   (Russian Federation)

Author keywords

CH3 radical; Chemical reaction; Deposition; Transport; Tungsten

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; COMPUTER SIMULATION; GAS MIXTURES; NUCLEAR REACTORS; TUNGSTEN;

CARBON DEPOSITION; HYDROGEN ATOMS; METHYL RADICALS; RADIOFREQUENCY INDUCTIVE DISCHARGE;

REACTION KINETICS;

EID: 40749144042     PISSN: 10519998     EISSN: 10294929     Source Type: Journal    
DOI: 10.1080/10519990701750825     Document Type: Article

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