Reactively sputtered TiO2 layers on SnO2:F substrates: A Raman and surface photovoltage study

Thin Solid Films

Volumn 516, Issue 12, 2008, Pages 3841-3846

  Mwabora, Julius M ^a   Ellmer, K ^a   Belaidi, A ^a   Rappich, J ^a   Bohne, W ^a   Rohrich J ^a   Dittrich, Th ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

Direct current reactive sputtering; Elastic recoil detection analysis; Raman spectroscopy; Surface photovoltage spectroscopy; Thin films; Titanium oxide

Indexed keywords

RAMAN SPECTROSCOPY; REACTIVE SPUTTERING; TITANIUM OXIDES;

DIRECT CURRENT REACTIVE SPUTTERING; ELASTIC RECOIL DETECTION ANALYSIS; SURFACE PHOTOVOLTAGE SPECTROSCOPY;

THIN FILMS;

EID: 40749093968     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.172     Document Type: Article

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