Enthalpy probe measurements and three-dimensional modelling on air plasma jets generated by a non-transferred plasma torch with hollow electrodes

Journal of Physics D: Applied Physics

Volumn 41, Issue 6, 2008, Pages

  Kim, Keun Su ^a,b   Park, Jin Myung ^a,c   Choi, Sooseok ^a   Kim, Jongin ^a,d   Hong, Sang Hee ^a  

^a Seoul National University   (South Korea)

^b UNIVERSITÉ DE SHERBROOKE   (Canada)

^c OAK RIDGE NATIONAL LABORATORY   (United States)

^d SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; ELECTRODES; GEOMETRY; PLASMA TORCHES; THREE DIMENSIONAL;

AIR PLASMA JETS; NON-TRANSFERRED PLASMA;

PLASMA JETS;

EID: 40649094741     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/6/065201     Document Type: Article

References (44)

1. Boulos M I 1991 IEEE Trans. Plasma Sci. 19 1078
2. Solonenko O P and Zhukov M F 1994 Thermal Plasma and New Materials Technology ed O P Solonenko and M F Zhukov (Cambridge: Cambridge Interscience Publishing)
3. Fauchais P and Vardelle A 1997 IEEE Trans. Plasma Sci. 25 1258
4. Pfender E 1999 Plasma Chem. Plasma Process. 19 1
5. Bonizzoni G and Vassallo E 2002 Vacuum 64 327
6. Heberlein J 2002 Pure Appl. Chem. 74 327
7. Hur M 2002 Numerical analysis and experiment studies on the plasma torch for hazardous waste treatment PhD Thesis Seoul National University, Seoul, Korea
8. Hur M and Hong S H 2002 J. Phys. D: Appl. Phys. 35 1946
9. Hur M, Kim K and Hong S H 2003 Plasma Sources Sci. Technol. 12 255
10. Wutze S A, Pfender E and Eckert E R G 1968 AIAA J. 6 1474
11. Pfender E 1994 Thin Solid Films 238 228
12. Brilhac J F, Pateyron B, Coudert J F, Fauchais P and Bouvier A 1995 Plasma Chem. Plasma Process. 15 257
13. Laux C O, Spence T G, Kruger C H and Zare R N 2003 Plasma Sources Sci. Technol. 12 125
14. Troue H H 1971 US Patent 3,612,933
15. Schmidt H and Muller R 1986 US Patent 4,596,019
16. Camacho S L and Camacho D P 1986 US Patent 4,587,397
17. Drouet M G 1987 US Patent 4,683,367
18. Barton T G and Fox E S 1987 US Patent 4,644,877
19. Schlienger M P 1988 US Patent 4,770,109
20. Hanus G J, Stahl J and Camacho S L 1994 US Patent 5,362,939
21. Camacho S L US Patent 5,634,414
22. Lampson R A, Haun R E, Brooks R S and Eschenbach R C 2001 US Patent 6,313,429
23. Fauchais P 1995 Thermal Plasmas for Hazardous Waste Treatment ed R Benocci et al (London: World Scientific)
24. Tzeng C, Kuo Y, Huang T, Lin D and YU Y 1998 J. Hazard. Mater. 58 207
25. Bonizzoni G 1999 Pure Appl. Chem. 71 1879
26. Taylor P R, Manrique M, Pirzada S A and Abdel-Latif M 1999 Plasma Chem. Plasma Process. 15 545
27. Mollah M Y A, Schennach R, Patscheider J, Promreuk S and Cocke D L 2000 J. Hazard. Mater. B 79 301
28. Harbec D, Meunier J-L, Guo L, Gauvin R and Mallah N El 2004 J. Phys. D: Appl. Phys. 37 2121
29. Kim K S, Hong S H, Lee K and Ju W T 2007 IEEE Trans. Plasma Sci. 35 434
30. Zhukov M F 1994 Thermal Plasma and New Materials Technology ed O P Solonenko and M F Zhukov (Cambridge: Cambridge Interscience Publishing)
31. Grey J and Jacobs P F 1964 AIAA J. 2 433
32. Brossa M and Pfender E 1988 Plasma Chem. Plasma Process. 1 75
33. Swank W D, Fincke J R and Haggard D C 1993 Rev. Sci. Instrum. 64 56
34. Chen W L T, Heberlein J and Pfender E 1993 Plasma Chem. Plasma Process. 14 317
35. Rahmane M, Soucy G and Boulos M I 1995 Rev. Sci. Instrum. 66 3424
36. Jankovic M and Mostaghimi J 1998 Plasma Chem. Plasma Process. 18 53
37. Choi S S, Hwang T H, Seo J H, Kim D U and Hong S H 2004 IEEE Trans. Plasma Sci. 32 473
38. Boulos M I, Fauchais P and Pfender E 1994 Thermal Plasmas: Fundamental and Applications vol 1 (New York: Plenum)
39. Kim K S, Park J M, Choi S S, Kim J and Hong S H 2008 Phys. Plasmas 15 at press
40. Park J M, Kim K S, Hwang T H and Hong S H 2004 IEEE Trans. Plasma Sci. 32 479
41. Lago F, Gonzales J J, Freton P and Gleizes A 2004 J. Phys. D: Appl. Phys. 37 883
42. Sanders N A and Pfender E 1984 J. Appl. Phys. 55 714
43. Kim K S, Lee D, Choi S S, Park J M and Hong S H 2003 45th Annual Meeting of APS Division of Plasma Physics (Albuquerque, NM: American Physical Society)
44. Kim K S, Seo J H, Nam J S, Ju W T and Hong S H 2005 IEEE Trans. Plasma Sci. 33 813