La and Nb codoped BiFe O3 multiferroic thin films on LaNi O3 Si and Ir O2 Si substrates

Applied Physics Letters

Volumn 92, Issue 9, 2008, Pages

  Cheng, Z X ^a   Wang, X L ^a   Kimura, H ^b   Ozawa, K ^b   Dou, S X ^a  

^a UNIVERSITY OF WOLLONGONG   (Australia)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

LEAKAGE CURRENTS; POLARIZATION; PULSED LASER DEPOSITION; SUBSTRATES; THIN FILMS;

SATURATED HYSTERESIS LOOP; THIN FILM CAPACITORS;

DOPING (ADDITIVES);

EID: 40549141463     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2890068     Document Type: Article

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