The electrochemical behavior of thermally oxidized CrN coatings deposited on steel by cathodic arc plasma deposition

Applied Surface Science

Volumn 236, Issue 1-4, 2004, Pages 406-415

  Chang, Ku Ling ^a   Chung, Shih Chun ^b   Lai, Shih Hsiang ^a   Shih, Han C ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Corrosion resistance; CrN; EIS; Thermal oxidation

Indexed keywords

CATHODES; CHROMATE COATINGS; CORROSION RESISTANCE; ELECTRIC IMPEDANCE; HEAT TREATMENT; NITROGEN; OXIDATION; STEEL; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

CATHODIC ARC PLASMA DEPOSITIONS (CAPD); COATED STEELS; CRN; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY (EIS); THERMAL OXIDATIONS;

CHROMIUM COMPOUNDS;

EID: 4043132403     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.05.024     Document Type: Article

References (24)

1. Holleck H. J. Vac. Sci. Technol. A4:1986;2661-2669.
2. Huber E., Hofmann S. Surf. Coat. Technol. 68-69:1994;64-69.
3. Panjan P., NavinŠek B., Cvelbar A., Zalar A., MiloŠev I. Surf. Coat. Technol. 281-282:1996;298-301.
4. Lu F.H., Chen H.Y. Thin Solid Films. 368:2001;398-399.
5. Hsieh W.P., Wang C.C., Lin C.H., Shieu F.S. J. Electrochem. Soc. 149:2002;234-238.
6. Herr W., Broszeit E. Surf. Coat. Technol. 97:1997;335-340.
7. Vetter J., Knaup R., Dwuletzki H., Schneider E., Vogler S. Surf. Coat. Technol. 86-87:1996;739-747.
8. Wang D.Y., Lin J.H., Ho W.Y. Thin Solid Films. 332:1998;246-254.
9. Liu C., Bi Q., Ziegele H., Leyland A., Matthews A. J. Vac. Sci. Technol. A20(3):2002;772-780.
10. Creus J., Mazille H., Idrissi H. Surf. Coat. Technol. 130:2000;224-232.
11. BertÓti I. Surf. Coat. Technol. 151-152:2002;194-203.
12. Cunha L., Andritschky M., Rebouta L., Pischow K. Surf. Coat. Technol. 116-119:1999;1152-1160.
13. MiloŠev I., Strehblow H.-H., NavinŠek B. Surf. Coat. Technol. 74-75:1995;897.
14. MiloŠev I., Strehblow H.-H., NavinŠek B. Thin Solid Films. 303:1997;246-254.
15. Lu F.H., Chen H.Y., Hung C.H. J. Vac. Sci. Technol. A21(3):2002;671-675.
16. Huber E., Hofmann S. Surf. Coat. Technol. 68-69:1994;64-69.
17. Kacsich T., Lieb K.-P. Thin Solid Films. 245:1994;4-6.
18. K. J. Vetter, Electrochemical Kinetics, Academic Press, New York, 1961, Chapter 5, p. 733.
19. Han S., Lin J.H., Tsai S.H., Chung S.C., Wang D.Y., Lu F.H., Shih H.C. Surf. Coat. Technol. 133-134:2000;460-465.
20. Liu C., Leyland A., Bi Q., Matthews A. Surf. Coat. Technol. 141:2001;164-173.
21. Dong H., Sun Y., Bell T. Surf. Coat. Technol. 90:1997;91-101.
22. Chang K.L., Han S., Lin J.H., Hsu J.W., Shih H.C. Surf. Coat. Technol. 172:2003;72-78.
23. A.J. Bard, L.R. Faulanker, Electrochemical Methods, Wiley, New York,1987, p. 16.
24. Chung S.C., Sung S.L., Hsien C.C., Shih H.C. J. Appl. Electrochem. 30:2000;607-615.