Thermal stability and electronic structure of atomically uniform Pb films on Si(111)

Physical Review Letters

Volumn 93, Issue 2, 2004, Pages

  Upton, M H ^a   Wei, C M ^b,c   Chou, M Y ^c   Miller, T ^a   Chiang, T C ^a  

^a University of Illinois at Urbana Champaign   (United States)

^b INSTITUTE OF PHYSICS   (Taiwan)

^c GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BINDING ENERGY; ELECTRONIC STRUCTURE; FERMI LEVEL; INTERFACIAL ENERGY; LATTICE CONSTANTS; LEAD; MONOLAYERS; OSCILLATIONS; PHASE SHIFT; PHOTOEMISSION; RESONANCE; SEMICONDUCTOR QUANTUM WELLS; THERMODYNAMIC STABILITY; THICKNESS MEASUREMENT;

ELECTRONIC ENERGY; PHOTOEMISSION SPECTRA; QUANTUM NUMBERS; QUANTUM OSCILLATIONS;

THIN FILMS;

EID: 4043132292     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevLett.93.026802     Document Type: Article

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