Quantum electronic stability of atomically uniform films

Science

Volumn 292, Issue 5519, 2001, Pages 1131-1133

  Luh, D A ^a   Miller, T ^a   Paggel, J J ^b   Chou, M Y ^c   Chiang, T C ^a  

^a United States of America   (United States)

^b FREIE UNIVERSITÄT BERLIN   (Germany)

^c GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRON ENERGY LEVELS; EMISSION SPECTROSCOPY; IRON; MONOLAYERS; PHOTOEMISSION; QUANTUM ELECTRONICS; SILVER; THERMODYNAMIC STABILITY; THIN FILMS;

PHOTOEMISSION SPECTROSCOPY;

METALLIC FILMS;

ARTICLE; ENERGY TRANSFER; FILM; MOLECULAR STABILITY; PRIORITY JOURNAL; QUANTUM MECHANICS; SPECTROSCOPY; TEMPERATURE SENSITIVITY; THICKNESS;

EID: 0035843953     PISSN: 00368075     EISSN: None     Source Type: Journal    
DOI: 10.1126/science.292.5519.1131     Document Type: Article

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15. Supported by the U.S. National Science Foundation (grants DMR-99-75470 and DMR-99-75182 to T.C.C) and the U.S. Department of Energy (grant DEFG02-97ER45632 to M.Y.C.). We acknowledge the Petroleum Research Fund, administered by the American Chemical Society, and the U.S. Department of Energy, Division of Materials Sciences (grant DEFG02-96ER45439), for partial support of the synchrotron beamline operation and the central facilities of the Materials Research Laboratory. The Synchrotron Radiation Center of the University of Wisconsin-Madison, where the experiment was done, is supported by the U.S. National Science Foundation (grant DMR-00-84402).