Effects of the pressure on growth of carbon nanotubes by plasma-enhanced hot filament CVD at low substrate temperature

Applied Surface Science

Volumn 236, Issue 1-4, 2004, Pages 6-12

  Wang, B B ^a   Lee, Soonil ^b   Xu, X Z ^c   Choi, Seungho ^b   Yan, H ^a   Zhang, B ^a   Hao, W ^a  

^a BEIJING UNIVERSITY OF TECHNOLOGY   (China)

^b Ajou University   (South Korea)

^c CHONGQING UNIVERSITY   (China)

Author keywords

Carbon nanotubes; Chemical vapor deposition; Glow discharge

Indexed keywords

ACTIVATED CARBON; CATALYSTS; GLOW DISCHARGES; GROWTH (MATERIALS); LOW TEMPERATURE OPERATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SUBSTRATES; THERMODYNAMICS; THICKNESS MEASUREMENT;

CARBON NANOTUBE GROWTH; HOT FILAMENTS; PARTICLE SURFACES; REACTION CHAMBERS;

CARBON NANOTUBES;

EID: 4043106937     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.03.243     Document Type: Article

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