Energy consumption and optimal reactor configuration for nonthermal plasma conversion of N2O in nitrogen and N2O in argon

Energy and Fuels

Volumn 18, Issue 5, 2004, Pages 1522-1530

  Zhao, Gui Bing ^a   Hu, Xudong ^a   Plumb, Ovid A ^a   Radosz, Maciej ^a  

^a UNIVERSITY OF WYOMING   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ENERGY CONVERSION; ENERGY EFFICIENCY; ENERGY UTILIZATION; FLUE GASES; MATHEMATICAL MODELS; NITROGEN; OPTIMIZATION; REACTION KINETICS;

NITROGEN DIOXIDE; NONTHERMAL PLASMA CONVERSION; OPTIMAL REACTOR CONFIGURATION;

NITROGEN OXIDES;

EID: 4043080878     PISSN: 08870624     EISSN: None     Source Type: Journal    
DOI: 10.1021/ef049966c     Document Type: Article

References (43)

1. Penetrante, B. M.; Hsiao, M. C.; Merritt, B. T.; Vogtlin, G. E.; Wallman, P. H. IEEE Trans. Plasma Sci. 1995, 23, 679-687.
2. Masuda, S. Report on novel dry DeNOx/DeSOx technology for cleaning combustion gases from utility thermal power plant boilers. In Nonthermal Plasma Techniques for Pollutuion Control; Penetrante, B. M., Schultheis, S. E., Eds.; Springer-Verlag: Berlin, 1993; Part B.
3. Luo, J.; Suib, S. L.; Marquez, M.; Hayashi, Y.; Matsumoto, H. J. Phys. Chem. A 1998, 102, 7954-7963.
4. Hackam, R.; Akiyama, H. IEEE Trans. Dielectr. Electr. Insul. 2000, 7, 654-683.
5. Penetrante, B. M. Plasma Chemistry and Power Consumption in Non-thermal DeNOx. In Nonthermal Plasma Techniques for Pollution Control; Penetrante, B. M., Schultheis, S. E., Eds.; Springer-Verlag: Heidelberg, Germany, 1993; Part A.
6. Puchkarev, V.; Gundersen, M. Appl. Phys. Lett. 1997, 71, 3364-3366.
7. Chang, J. S.; Looy, P. C.; Nagai, K.; Yoshioka, T.; Aoki, S.; Maezawa, A. IEEE Trans. Ind. Appl. 1996, 32, 131-137.
8. Mok, Y. S.; Nam, I. S. IEEE Trans. Plasma Sci. 1999, 27, 1188-1196.
9. Urashima, K.; Chang, J. S.; Ito, T. IEEE Trans. Ind. Appl. 1997, 33, 879-886.
10. Urashima, K.; Chang, J. S.; Park, J. Y.; Lee, D. C.; Chakrabarti, A.; Ito, T. IEEE Trans. Ind. Appl. 1998, 34, 934-939.
11. Park, J. Y.; Tomicic, I.; Round, G. F.; Chang, J. S. J. Phys. D: Appl. Phys. 1999, 32, 1006-1011.
12. Dinelli, G.; Civitano, L.; Rea, M. IEEE Trans. Ind. Appl. 1990, 26, 535-541.
13. Chung, J. W.; Cho, M. H.; Son, B. H.; Mok, Y. S.; Namkung, W. Plasma Chem. Plasma Process. 2000, 20, 495 509.
14. van Veldhuizen, E. M.; Zhou, L. M.; Rutgers, W. R. Plasma Chem. Plasma Process. 1998, 18, 91-111.
15. Mizuno, A.; Shimizu, K.; Chakrabarti, A.; Dascalescu, L.; Furuta, S. IEEE Trans. Ind. Appl. 1995, 31, 957-963.
16. Mok, Y. S.; Kim, J. H.; Nam, I. S.; Ham, S. W. Ind. Eng. Chem. Res. 2000, 39, 3938-3944.
17. Rea, M.; Yan, K. IEEE Trans. Ind. Appl. 1995, 31, 507-511.
18. Mok, Y. S.; Ham, S. W.; Nam, I. S. Plasma Chem. Plasma Process. 1998, 18, 535-550.
19. Korzekwa, R. A.; Grothaus, M. G.; Hutcherson, R. K.; Roush, R. A.; Brown, R. Rev. Sci. Instrum. 1998, 69, 1886-1892.
20. Uhm, H. S.; Lee, W. M. Phys. Plasmas 1997, 4, 3117-3128.
21. Tas, M. A.; van Hardeveld, R.; van Veldhuizen, E. M. Plasma Chem. Plasma Process. 1997, 17, 371-391.
22. Yan, K.; Van Heesch, E. J. M.; Pemen, A. J. M.; Huijbrechts, P. A. H. J. Plasma Chem. Plasma Process. 2001, 21, 107-137.
23. Collings, M. E.; Mann, M. D.; Young, B. C. Energy Fuels 1993, 7, 554-558.
24. Hu, X.; Nicholas, J.; Zhang, J. J.; Linjewile, T. M.; de Filippis, P.; Agarwal, P. K. Fuel 2002, 81, 1259-1268.
25. Futamura, S.; Zhang, A.; Yamamoto, T. IEEE Trans. Ind. Appl. 2000, 36, 1507-1514.
26. Zhao, G. B.; Hu, X.; Argyle, M. D.; Radosz, M. Ind. Eng. Chem. Res. 2004, 43, 5077-5088.
27. Hu, X.; Zhang, J.-J.; Mukhnahallipatna, S.; Hamann, J.; Biggs, M. J.; Agarwal, P. Fuel 2003, 82, 1675-1684.
28. Zhao, G. B.; Hu, X.; Yeung, M. C.; Plumb, O. A.; Radosz, M. Ind. Eng. Chem. Res. 2004, 43, 2315-2323.
29. Willis, C.; Boyd, A. W.; Bindner, P. E. Can. J. Chem. 1972, 50, 1557-1567.
30. Hill, R. D.; Rahmim, I.; Rinker, R. G. Ind. Eng. Chem. Res. 1988, 27, 1264-1269.
31. Thomas, J. M.; Kaufman, F.; Golde, M. F. J. Chem. Phys. 1987, 86, 6885-6892.
32. Guerra, V.; Sa, P. A.; Loureiro, J. J. Phys. D: Appl. Phys. 2001, 34, 1745-1755.
33. Golde, M. F. Int. J. Chem. Kinet. 1988, 20, 75-92.
34. Morrill, J. S.; Benesch, W. M. J. Geophys. Res. 1996, 101, 261-274.
35. Simek, M. Plasma Sources Sci. Technol. 2003, 12, 454-463.
36. Simek, M. Plasma Sources Sci. Technol. 2003, 12, 421-431.
37. Guerra, V.; Sa, P. A.; Loureiro, J. J. Phys. D: Appl. Phys. 2001, 34, 1-11.
38. Shul, R. J.; Upschulte, B. L.; Passarella, R.; Keesee, R. G.; Castleman, J. A. W. J. Phys. Chem. 1987, 91, 2556-2562.
39. Matzing, H. Chemical Kinetics of Flue Gas Cleaning by Irradiation with Electrons. In Advances in Chemical Physics; Prigogine, I., Rice, S. A., Eds.; John Wiley & Sons: New York, 1991; Vol. LXXX, pp 315-402.
40. Herron, J. T.; Green, D. S. Plasma Chem. Plasma Process. 2001, 21, 459-481.
41. Kossyi, I. A.; Kostinsky, A. Y.; Matveyev, A. A.; Silakov, V. P. Plasma Sources Sci. Technol. 1992, 1, 207-220.
42. Atkinson, R.; Baulch, D. L.; Cox, R. A.; Hampson, J. R. F.; Kerr, J. A.; Troe, J. J. Phys. Chem. Ref. Data 1989, 18, 881-1097.
43. Atkinson, R.; Baulch, D. L.; Cox, R. A.; Hampson, J. R. F.; Kerr, J. A.; Rossi, M. J.; Troe, J. J. Phys. Chem. Ref. Data 1997, 26, 1329-1499.