Decomposition of NOx with low-temperature plasmas at atmospheric pressure: Neat and in the presence of oxidants, reductants, water, and carbon dioxide

Journal of Physical Chemistry A

Volumn 102, Issue 41, 1998, Pages 7954-7963

  Luo, Jian ^a   Suib, Steven L ^a,b   Marquez, Manuel ^a,c   Hayashi, Yuji ^d   Matsumoto, Hiroshige ^e  

^a UNIVERSITY OF CONNECTICUT   (United States)

^b Yale University   (United States)

^c YALE UNIVERSITY   (United States)

^d FUJITSU LABORATORIES LTD   (Japan)

^e NAGASAKI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001418692     PISSN: 10895639     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp982013t     Document Type: Article

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