Composition, structure and electrical properties of alumina barrier layers grown in fluoride-containing oxalic acid solutions

Acta Materialia

Volumn 56, Issue 6, 2008, Pages 1390-1398

  Jagminas, A ^a   Vrublevsky, I ^b   Kuzmarskyte, J ^a   Jasulaitiene, V ^a  

^a CENTER FOR PHYSICAL SCIENCES AND TECHNOLOGY   (Lithuania)

^b BELARUSIAN STATE UNIVERSITY OF INFORMATICS AND RADIOELECTRONICS   (Belarus)

Author keywords

Aluminum; Anodization; Barrier layer; Interface structure

Indexed keywords

DISSOLUTION; GROWTH RATE; MOLECULAR STRUCTURE; PHASE COMPARATORS; POROUS MATERIALS; X RAY PHOTOELECTRON SPECTROSCOPY;

ANODIZATION; BARRIER LAYERS; INTERFACE STRUCTURE; OXALIC ACID;

ALUMINA;

EID: 40149093232     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2007.11.029     Document Type: Article

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