Simulation and optimization of silicon thermal CVD through CFD integrating Taguchi method

Chemical Engineering Journal

Volumn 137, Issue 3, 2008, Pages 603-613

  Cheng, W T ^a   Li, H C ^a   Huang, C N ^a  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

Author keywords

CFD; Optimization; Silicon; Simulation; Taguchi method; Thermal CVD

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTATIONAL FLUID DYNAMICS; COMPUTER SIMULATION; HEAT TRANSFER; LAMINAR FLOW; OPTIMIZATION; SURFACE CHEMISTRY; TAGUCHI METHODS;

GAS-PHASE CHEMISTRY; THERMAL CVD;

SILICON;

CHEMICAL VAPOR DEPOSITION; COMPUTATIONAL FLUID DYNAMICS; COMPUTER SIMULATION; HEAT TRANSFER; LAMINAR FLOW; OPTIMIZATION; SILICON; SURFACE CHEMISTRY; TAGUCHI METHODS;

EID: 39749125017     PISSN: 13858947     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cej.2007.05.042     Document Type: Article

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