IR laser-induced co-decomposition of trisilane and thiirane for deposition of polycarbosilthiane films

Journal of Analytical and Applied Pyrolysis

Volumn 81, Issue 2, 2008, Pages 225-230

  Pola, Josef ^a   Urbanová, Markéta ^a   Santos, Magna ^b   Díaz, Luis ^b   Šubrt, Jan ^c  

^a INSTITUTE OF CHEMICAL PROCESS FUNDAMENTALS   (Czech Republic)

^b INSTITUTO DE ESTRUCTURA DE LA MATERIA   (Spain)

^c INSTITUTE OF INORGANIC CHEMISTRY   (Czech Republic)

Author keywords

Co decomposition; Laser induced polymers; Polycarbosiloxane; Polycarbosilthiane; Silicon sulfide; Thiirane; Trisilane

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; INFRARED DEVICES; LASER PULSES; POLYMER FILMS;

CO-DECOMPOSITION; LASER INDUCED POLYMERS; POLYCARBOSILOXANE; POLYCARBOSILTHIANE; SILICON SULFIDE; THIIRANE; TRISILANE;

SILANES;

EID: 39149085675     PISSN: 01652370     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jaap.2007.11.008     Document Type: Article

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