Thermal and ion induced annealing of nanocrystalline ZnO thin film deposited by atom beam sputtering

Journal of Physics D: Applied Physics

Volumn 41, Issue 4, 2008, Pages

  Agarwal, D C ^a   Singh, F ^b   Kabiraj, D ^b   Sen, S ^c   Kulariya, P K ^b   Sulania, I ^b   Nozaki, S ^c   Chauhan, R S ^a   Avasthi, D K ^b  

^a R B S COLLEGE   (India)

^b INTER UNIVERSITY ACCELERATOR CENTRE   (India)

^c UNIVERSITY OF ELECTRO COMMUNICATIONS   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; HEAVY IONS; NANOCRYSTALLINE MATERIALS; SPUTTERING; X RAY DIFFRACTION; ZINC OXIDE;

ATHERMAL ANNEALING; TEMPERATURE ANNEALING; THERMAL ANNEALING; ZNO THIN FILMS;

THIN FILMS;

EID: 38949184180     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/4/045305     Document Type: Article

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